{"id":2367,"date":"2026-04-20T10:24:49","date_gmt":"2026-04-20T08:24:49","guid":{"rendered":"https:\/\/www.saesgetters.com\/highvacuum\/?p=2367"},"modified":"2026-05-04T11:18:30","modified_gmt":"2026-05-04T09:18:30","slug":"nextorr-pump-for-electron-beam-lithography-saes-high-vacuum-raith-ebpg-system","status":"publish","type":"post","link":"https:\/\/www.saesgetters.com\/highvacuum\/nextorr-pump-for-electron-beam-lithography-saes-high-vacuum-raith-ebpg-system\/","title":{"rendered":"NEXTorr\u00ae Pump for Electron Beam Lithography | SAES High Vacuum &amp; RAITH EBPG System"},"content":{"rendered":"<div class=\"headline container\">\n    <div class=\"col-12\">\n    <h1 class=\"h1 title\">Enabling Precision in Electron Beam Lithography: SAES NEXTorr\u00ae in RAITH EBPG Systems<\/h1>  <\/div>\n<\/div>\n\n\n<div class=\"container\">\n      <div class=\"col-6\">\n      <div>\n        <p>For several years, SAES High Vacuum has been collaborating with <a href=\"https:\/\/raith.com\/products\/electron-beam-lithography\/\"><strong>RAITH<\/strong><\/a>, a leading company in <strong>electron beam lithography systems<\/strong>, contributing to the development and <strong>performance optimization of advanced solutions for nanoscale patterning<\/strong>.<\/p>\n<p>At the core of this collaboration is the integration of <a href=\"https:\/\/www.saesgetters.com\/highvacuum\/solution\/nextorr-d-z-uhv\/\"><strong>SAES NEXTorr pumps<\/strong><\/a> within the RAITH EBPG (Electron Beam Pattern Generator) system \u2014 a <strong>high-resolution e-beam lithography platform<\/strong> designed for demanding applications in research and semiconductor fabrication.<\/p>\n      <\/div>\n    <\/div>\n        <div class=\"col-6\">\n      <div>\n              <\/div>\n    <\/div>\n    <\/div>\n\n\n<div class=\"container align-items-center greyed flip\">\n    <div class=\"col-6 order-md-2\">\n    <h3 class=\"h3 title\">The Role of Vacuum in Electron Beam Lithography <\/h3><p>Electron beam lithography requires <strong>extremely stable and clean vacuum conditions<\/strong>, particularly at the electron source (gun), where even small variations can impact <strong>beam quality and system performance<\/strong>. In this context, the choice of the pumping solution becomes a critical factor.<\/p>\n<h3>SAES NEXTorr: Compact and High-Performance Vacuum Solution<\/h3>\n<p>NEXTorr technology combines <strong>non-evaporable getter (NEG)<\/strong> and <strong>ion pump<\/strong> capabilities in a compact and efficient design, offering several advantages that directly enhance system performance:<\/p>\n<ul>\n<li><strong>Compact design and low weight<\/strong><br \/>\nWith a weight of only 2\u20133 kg, NEXTorr pumps are easy to handle and integrate.<\/li>\n<li><strong>High pumping speed and improved vacuum quality<br \/>\n<\/strong>The high pumping rate allows lower pressure at the gun, resulting in longer electron source lifetime and improved brightness \u2014 key parameters for achieving high-resolution patterning.<\/li>\n<li><strong>Operational continuity without power<\/strong><br \/>\nOne of the distinctive features of NEXTorr is its ability to maintain vacuum conditions even in the absence of power. This enables safe transport of the gun under vacuum without the need for batteries, eliminates the need for re-baking at the user site, and significantly reduces system installation time. In addition, it ensures faster recovery in case of unexpected power interruptions.<\/li>\n<\/ul>\n          <a class=\"btn\" href=\"https:\/\/www.saesgetters.com\/highvacuum\/solution\/nextorr-hv\/\">\n            <span class='the-arrow -left'>\n              <span class='shaft'><\/span>\n            <\/span>\n            <span class=\"main\">\n              <span class=\"text\">Read more about NEXTorr pumps<\/span>\n              <span class='the-arrow -right'>\n                <span class='shaft'><\/span>\n              <\/span>\n            <\/span>\n            <span class=\"circle-effect\"><\/span>\n          <\/a>\n            <\/div>\n    <div class=\"col-6 order-md-1\">\n    <div class=\"overlay-container two-columns-image-text ratio-4-5\">\n      \n        <img decoding=\"async\" src=\"https:\/\/saesgetter-space.fra1.digitaloceanspaces.com\/wp-content\/uploads\/sites\/5\/2026\/04\/20095323\/raith-ebpg-NEXTorr-high-vacuum-784x980.jpg\" srcset=\"https:\/\/saesgetter-space.fra1.digitaloceanspaces.com\/wp-content\/uploads\/sites\/5\/2026\/04\/20095323\/raith-ebpg-NEXTorr-high-vacuum-784x980.jpg 784w, https:\/\/saesgetter-space.fra1.digitaloceanspaces.com\/wp-content\/uploads\/sites\/5\/2026\/04\/20095323\/raith-ebpg-NEXTorr-high-vacuum-880x1100.jpg 880w\" alt=\"SAES Getters | raith-ebpg-NEXTorr-high-vacuum\"><div class=\"gradien-light\"><\/div>    <\/div>\n  <\/div>\n<\/div>\n\n\n<div class=\"container\">\n      <div class=\"col-6\">\n      <div>\n        <h2 class=\"h3 title\">Improving Electron Source Stability and Lifetime <\/h2><p>The integration of NEXTorr within the RAITH EBPG system demonstrates how<strong> advanced vacuum technologies can directly contribute to improving reliability, efficiency, and performance in electron beam lithography<\/strong>.<\/p>\n<p>This long-standing collaboration reflects a shared focus on <strong>precision engineering and continuous innovation<\/strong>, supporting the development of next-generation nanofabrication tools.<\/p>\n      <\/div>\n    <\/div>\n        <div class=\"col-6\">\n      <div>\n              <\/div>\n    <\/div>\n    <\/div>\n\n\n<div class=\"container\">\n      <div class=\"col-6\">\n      <div>\n        <h2>Explore how NEXTorr technology can support your electron beam applications and improve system performance.<\/h2>\n              <a class=\"btn\" href=\"https:\/\/www.saesgetters.com\/highvacuum\/applications\/electron-microscopy\/\">\n                <span class='the-arrow -left'>\n                  <span class='shaft'><\/span>\n                <\/span>\n                <span class=\"main\">\n                  <span class=\"text\">Read more<\/span>\n                  <span class='the-arrow -right'>\n                    <span class='shaft'><\/span>\n                  <\/span>\n                <\/span>\n                <span class=\"circle-effect\"><\/span>\n              <\/a>\n                    <\/div>\n    <\/div>\n        <div class=\"col-6\">\n      <div>\n              <\/div>\n    <\/div>\n    <\/div>\n","protected":false},"excerpt":{"rendered":"","protected":false},"author":7,"featured_media":2368,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"inline_featured_image":false},"categories":[1],"acf":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v21.7 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>NEXTorr\u00ae Pump for Electron Beam Lithography | SAES High Vacuum &amp; RAITH EBPG System | SAES High Vacuum<\/title>\n<meta name=\"description\" content=\"Discover how SAES NEXTorr pumps enhance RAITH EBPG electron beam lithography systems, improving vacuum stability, source lifetime and overall performance.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.saesgetters.com\/highvacuum\/nextorr-pump-for-electron-beam-lithography-saes-high-vacuum-raith-ebpg-system\/\" \/>\n<meta property=\"og:locale\" content=\"en_US\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"NEXTorr\u00ae Pump for Electron Beam Lithography | SAES High Vacuum &amp; RAITH EBPG System | SAES High Vacuum\" \/>\n<meta property=\"og:description\" content=\"Discover how SAES NEXTorr pumps enhance RAITH EBPG electron beam lithography systems, improving vacuum stability, source lifetime and overall performance.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.saesgetters.com\/highvacuum\/nextorr-pump-for-electron-beam-lithography-saes-high-vacuum-raith-ebpg-system\/\" \/>\n<meta property=\"og:site_name\" content=\"SAES High Vacuum\" \/>\n<meta property=\"article:published_time\" content=\"2026-04-20T08:24:49+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2026-05-04T09:18:30+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/saesgetter-space.fra1.digitaloceanspaces.com\/wp-content\/uploads\/sites\/5\/2026\/04\/10114355\/SAES-NEXTorr-pump-raith-ebpg.jpg?_t=1777886311\" \/>\n\t<meta property=\"og:image:width\" content=\"1920\" \/>\n\t<meta property=\"og:image:height\" content=\"1080\" \/>\n\t<meta property=\"og:image:type\" content=\"image\/jpeg\" \/>\n<meta name=\"author\" content=\"Fabio Prestini\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"Fabio Prestini\" \/>\n\t<meta name=\"twitter:label2\" content=\"Est. reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"1 minute\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"Article\",\"@id\":\"https:\/\/www.saesgetters.com\/highvacuum\/nextorr-pump-for-electron-beam-lithography-saes-high-vacuum-raith-ebpg-system\/#article\",\"isPartOf\":{\"@id\":\"https:\/\/www.saesgetters.com\/highvacuum\/nextorr-pump-for-electron-beam-lithography-saes-high-vacuum-raith-ebpg-system\/\"},\"author\":{\"name\":\"Fabio Prestini\",\"@id\":\"https:\/\/www.saesgetters.com\/highvacuum\/#\/schema\/person\/585d38258bfd7dc45a6d3553162964f2\"},\"headline\":\"NEXTorr\u00ae Pump for Electron Beam Lithography | SAES High Vacuum &amp; 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