CapaciTorr HV
The CapaciTorr® HV pumps integrate the ZAO® high vacuum NEG alloy specifically conceived to sorb large gas throughput at pressure levels as low as 10-7 Torr. CapaciTorr HV benefits:
- utmost capacity for all active gases
- possibility to start the activation at low vacuum (i.e. 1e-2 Torr)
To exploit these benefits, the Capacitorr HV pumps must be operated permanently warm at around 200 °C. All the available models feature easily replaceable NEG cartridge.
Pumping Speed and Capacity for the Main Gas Species
Product Description | Pumping Speed (l/s) | Sorption Capacity (Torr l) | ||||||||
H2 | H2O | O2 | N2 | CO2* | H2 | H2O | O2 | N2 | CO2* | |
CapaciTorr HV 200 (CF35) | 105 | 40 | 32 | 30 | 25 | 2800 | 400 | 200 | 200 | 40 |
CapaciTorr HV 200 (CF63) | 210 | 120 | 90 | 60 | 65 | 2800 | 400 | 200 | 200 | 40 |
CapaciTorr HV 1600 | 1700 | 1000 | 800 | 470 | 620 | 13800 | 1600 | 800 | 800 | 160 |
CapaciTorr HV 2100 | 2100 | 1500 | 1250 | 625 | 880 | 22600 | 2600 | 1300 | 1300 | 260 |
Notes:
Pumping speed data refer to the initial values measured at pump inlet.
The capacity values (except for H2) are intended as the recommended absorbed quantity per run at around 200 °C, allowing to perform more than 20 sorption cycles. In case of operation under lower gas loads or at RT, the pump can be reactivated 100 times or more.
The values for H2O are estimated.
(*) The values for CO can be assumed very similar to those reported for CO2.
General Features
- Extremely compact and low weight
- High pumping speed for all active gases
- High sorption capacity and lifetime
- Constant pumping speed in UHV and XHV
- Oil free and vibration free
- Operation in presence of high magnetic fields
- Reversible pumping of hydrogen and its isotopes
- Fast pumpdown after air venting and without baking
- Capable of coping with large air leaks
- Suitable for viton-sealed systems
Applications
- Improving ultimate vacuum in combination with ion, diffusion, cryogenic or turbomolecular pumps
- Particle accelerators, synchrotron radiation sources and related equipment
- Scanning/Transmission electron microscopes
- Portable vacuum instrumentation
- Surface analysis systems
- Process pumps for vacuum devices and deposition chambers
- Thin films deposition systems
- Pumping, storing and releasing hydrogen isotopes
- Impurities removal in rare gas filled devices