NEXTorr HV

The NEXTorr® HV pumps are compact high vacuum pumping solutions that integrate a sputter ion pump (SIP) and a non-evaporable getter (NEG) pump into a single, high-efficiency system. This hybrid configuration ensures exceptional pumping speed, high sorption capacity, and low weight, making it ideal for applications where space constraints and performance are critical.

Each pump incorporates ZAO® (Zr-V-Ti-Al) NEG alloy, specifically engineered for high vacuum environments, to provide superior gas capture capability across all active gases, including H₂, O₂, CO, CO₂, and N₂.

Notes:

Pumping speed values refer to initial measurements with the NEG element fully exposed within the vacuum chamber (“nude” configuration), ensuring maximum gas sorption performance.

H₂O values are estimated, as precise calibration under all environmental conditions is complex.

Sorption capacity values (except for H₂) are based on performance at ~200 °C, supporting 20+ regeneration cycles under standard high vacuum operation. Under lower gas load conditions or room temperature (RT) usage, the pump can be reactivated 100 times or more.

CO pumping capacity is considered comparable to CO₂, given their similar interaction with getter materials.

• Ultra-compact design with low weight for easy integration into high vacuum systems.
• Consistent high pumping speed for all active gases, including hydrogen, oxygen, and nitrogen.
• Efficient noble gas and methane pumping, supporting challenging gas mixtures in harsh environments.
• Large sorption capacity even in non-baked or elastomer-sealed systems.
• Rapid pump-down performance after air venting—no baking required.
• Ideal for Viton-sealed vacuum chambers and setups with significant outgassing.
• Low power consumption during continuous operation at ~200 °C.
• Engineered for minimal magnetic field interference, supporting use near sensitive instruments.
• Integrated pressure indication capability, simplifying system diagnostics.

• Enhancing the ultimate pressure in high vacuum (HV) and ultra-high vacuum (UHV) environments.
• Essential in particle accelerators, synchrotron radiation sources, and beamlines.
• Applied in SEM and TEM electron microscopes, improving imaging quality by reducing residual gas.
• Deployed in portable vacuum systems and field-deployable instrumentation.
• Used in surface science and material characterization systems requiring stable HV/UHV.
• Trusted as process pumps for vacuum chambers in semiconductor and thin film deposition.
• Ideal for controlled hydrogen isotope pumping, storage, and release in fusion and energy research.