NEXTorr® Pump for Electron Beam Lithography | SAES High Vacuum & RAITH EBPG System
Enabling Precision in Electron Beam Lithography: SAES NEXTorr® in RAITH EBPG Systems
For several years, SAES High Vacuum has been collaborating with RAITH, a leading company in electron beam lithography systems, contributing to the development and performance optimization of advanced solutions for nanoscale patterning.
At the core of this collaboration is the integration of SAES NEXTorr pumps within the RAITH EBPG (Electron Beam Pattern Generator) system — a high-resolution e-beam lithography platform designed for demanding applications in research and semiconductor fabrication.
The Role of Vacuum in Electron Beam Lithography
Electron beam lithography requires extremely stable and clean vacuum conditions, particularly at the electron source (gun), where even small variations can impact beam quality and system performance. In this context, the choice of the pumping solution becomes a critical factor.
SAES NEXTorr: Compact and High-Performance Vacuum Solution
NEXTorr technology combines non-evaporable getter (NEG) and ion pump capabilities in a compact and efficient design, offering several advantages that directly enhance system performance:
- Compact design and low weight
With a weight of only 2–3 kg, NEXTorr pumps are easy to handle and integrate. - High pumping speed and improved vacuum quality
The high pumping rate allows lower pressure at the gun, resulting in longer electron source lifetime and improved brightness — key parameters for achieving high-resolution patterning. - Operational continuity without power
One of the distinctive features of NEXTorr is its ability to maintain vacuum conditions even in the absence of power. This enables safe transport of the gun under vacuum without the need for batteries, eliminates the need for re-baking at the user site, and significantly reduces system installation time. In addition, it ensures faster recovery in case of unexpected power interruptions.
Improving Electron Source Stability and Lifetime
The integration of NEXTorr within the RAITH EBPG system demonstrates how advanced vacuum technologies can directly contribute to improving reliability, efficiency, and performance in electron beam lithography.
This long-standing collaboration reflects a shared focus on precision engineering and continuous innovation, supporting the development of next-generation nanofabrication tools.
